A method of preparing a sample for physical analysis

This invention provides a method of preparing a sample for physical analysis, comprising the steps of providing a specimen, and forming a low-temperature atomic layer deposition film on the specimen to generate a sample for physical analysis. 本发明公开了一种物性分析试片的制备方法，其包括以下步骤：提供一待进行物性分析的样品；以及形成一低温原子层沉积(At...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	CHEN YUHAN, HUANG BANGHAO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	This invention provides a method of preparing a sample for physical analysis, comprising the steps of providing a specimen, and forming a low-temperature atomic layer deposition film on the specimen to generate a sample for physical analysis. 本发明公开了一种物性分析试片的制备方法，其包括以下步骤：提供一待进行物性分析的样品；以及形成一低温原子层沉积(Atomic Layer Deposition,ALD)薄膜于该待进行物性分析的样品表面，制备出一物性分析试片。