Liquid storage equipment, wafer processing device and liquid supply method

The invention relates to liquid storage equipment, a wafer processing device and a liquid supply method. The liquid storage equipment, the wafer processing device and the liquid supply method can improve the quality of a photoresist layer spin-coated on a target surface, avoid a poor final photoetching result and improve the yield of wafer production. The liquid storage equipment comprises a liquid buffer tank used for containing liquid, and further comprises an ultrasonic oscillator which is installed in the liquid buffer tank and used for enabling the liquid contained in the liquid buffer tank to vibrate so as to discharge bubbles in the liquid contained in the liquid buffer tank; a transducer is arranged in the ultrasonic oscillator, and ultrasonic waves are transmitted into the liquid buffer tank by the transducer. 该发明涉及一种储液设备、晶圆处理装置以及供液方法，能够提高旋涂至目标表面的光阻层的质量，避免最终的光刻结果不佳，提高晶圆生产的良率。其中所述储液设备包括液体缓冲槽，用于盛装液体，还包括超声波震荡器，安装至所述液体缓冲槽，用于使所述液体缓冲槽内盛装的液体震动，以排出所述液体缓冲槽内盛装的液体内的气泡；所述超声波震荡器内设置有换能器，由所述换能器将超声波发射至所述液体缓冲槽内。