METHOD AND SYSTEM FOR CHARACTERIZING SURFACE UNIFORMITY

A method includes emitting light from a light source (12) onto an at least partially reflective surface (24). The reflected light (30) is collected from the surface at a screen (32) to capture the intensity distribution (34) of the reflected light with a camera (40) in a first image (42). The intens...

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Hauptverfasser:	ELIASON JEFFREY K, GULLICKSON JOSHUA A, CARUSO FRANCIS T, HOFELDT DAVID L, HERNANDEZ JOSEPH E
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CALCULATING COMPUTING COUNTING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A method includes emitting light from a light source (12) onto an at least partially reflective surface (24). The reflected light (30) is collected from the surface at a screen (32) to capture the intensity distribution (34) of the reflected light with a camera (40) in a first image (42). The intensity distribution of the first image of the reflected light is processed (50) by performing suitable filtering of a Fourier transform of the intensity distribution of the reflected light so as to emphasize features having an intensity variation of interest. The features of the intensity distribution of the reflected light having the variation of interest are analyzed to determine a uniformity value for the surface. 本发明公开了一种方法，该方法包括将光从光源(12)发射到至少部分反射的表面(24)上。在屏幕(32)处从表面收集反射光(13)，以利用相机(40)在第一图像(42)中捕获反射光的强度分布(34)。通过对反射光的强度分布的傅里叶变换执行合适的滤波来处理(50)反射光的第一图像的强度分布，以便强调具有感兴趣的强度变化的特征。分析该反射光的该强度分布的具有该感兴趣的变化的特征以确定该表面的均匀度值。