Semiconductor structure analysis method

The invention provides a semiconductor structure analysis method, which comprises the following steps: providing a substrate on an insulator, the substrate comprising an upper semiconductor layer, a lower semiconductor layer and an oxide layer located between the upper semiconductor layer and the lo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YUAN ANDONG, YIN SHENGNAN, GAO JINDE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
Online-Zugang:	Volltext bestellen
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