Semiconductor cleaning equipment with self-cleaning function

The invention discloses semiconductor cleaning equipment with a self-cleaning function, and belongs to the technical field of semiconductors. The equipment comprises a wafer bearing platform, a first lifting mechanism, an outer cover, a plurality of recycling rings, a cleaning liquid supply end and a control mechanism. First nozzles are arranged at the edge of the outer cover; splash-proof plates are obliquely arranged on the recycling rings, nozzle modules are arranged on the splash-proof plates, and a cavity is formed between every two adjacent splash-proof plates; and the control mechanism controls the cleaning liquid supply end to provide cleaning liquid according to a cleaning instruction and controls the first lifting mechanism to ascend and descend so that the first nozzles can be flush with one splash-proof plate, and then the corresponding cavities can be cleaned through the first nozzles. According to the equipment, the cleaning equipment has the beneficial effects that the first nozzles can clean t