GAS MIXTURE INCLUDING HYDROGEN FLUORIDE, ALCOHOL AND AN ADDITIVE FOR PREVENTING STICTION OF AND/OR REPAIRING HIGH ASPECT RATIO STRUCTURES

A gas mixture for treating a substrate in a substrate processing system includes hydrogen fluoride gas, a vapor of an alcohol, an additive consisting of a base, and a carrier gas. The gas mixture can be used to treat high aspect ratio (HAR) structures arranged on a surface of a substrate. A surface of the substrate may be spin rinsed using a first rinsing liquid. The first rinsing liquid is spun off from the surface of the substrate. The gas mixture is directed onto the surface of the substrate after the first rinsing liquid is dispensed. 一种用于处理衬底处理系统中的衬底的气体混合物包括氟化氢气体、醇的蒸气、由碱类构成的添加剂、及载体气体。该气体混合物可用于处理被配置在衬底的表面上的高深宽比(HAR)结构。可使用第一冲洗液体来旋转冲洗衬底的表面。该第一冲洗液体从衬底的表面被旋离。在第一冲洗液体被配送之后，该气体混合物被引导到衬底的表面上。