FILM FORMING APPARATUS AND METHOD FOR CONTROLLING FILM FORMING APPARATUS

The invention relates to a film forming apparatus and a control method of the film forming apparatus. Efficient operation of a film forming apparatus is achieved by shortening the time when a substrate is separated from a substrate adsorption member (electrostatic chuck). The film forming apparatus...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	AONUMA DAISUKE, SUGAWARA HIROKI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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