SUBSTRATE PROCESSING DEVICE

A substrate processing device (1) comprises a plurality of converging pipes (61a to 61c) arranged above a plurality of processing units (31) arrayed in a vertical direction. The plurality of converging pipes (61a to 61c) respectively correspond to a plurality of fluid sections. Further, a plurality of exhaust pipes (4) which extend upward from the plurality of processing units (31) and into which exhaust from the plurality of processing units (31) flows are provided. A flow path switch unit (5) is provided at the upper end of each of the exhaust pipes (4) to connect the upper end to the plurality of converging pipes (61a to 61c) and to switch the flow path of exhaust flowing through the exhaust pipes (4) between the plurality of converging pipes (61a to 61c). With the substrate processing device (1), it is possible to reduce pressure loss in the exhaust pipe (4) and to make footprint smaller. 在基板处理装置(1)中，与沿上下方向排列的多个处理部(31)相比在上方配置有多个集合管(61a～61c)。多个集合管(61a～61c)与多个流体类别分别对应。另外，设有从多个处理部(31)趋向上方、并且供来自多个处理部(31)的排气分别