DISPOSITIONING DEFECTS DETECTED ON EXTREME ULTRAVIOLET PHOTOMASKS

Methods and systems for photomask defect dispositioning are provided. One method includes directing energy to a photomask and detecting energy from the photomask. The photomask is configured for use at one or more extreme ultraviolet wavelengths of light. The method also includes detecting defects on the photomask based on the detected energy. In addition, the method includes generating charged particle beam images of the photomask at locations of the detected defects. The method further includes dispositioning the detected defects based on the charged particle beam images generated for the detected defects. 本发明提供用于光掩模缺陷处理的方法及系统。一种方法包含将能量引导到光掩模并从所述光掩模检测能量。所述光掩模经配置以供在一或多个极紫外光波长处使用。所述方法还包含基于所述所检测能量而检测所述光掩模上的缺陷。另外，所述方法包含在所述所检测缺陷的位置处产生所述光掩模的带电粒子束图像。所述方法进一步包含基于针对所述所检测缺陷产生的所述带电粒子束图像而处理所述所检测缺陷。