METHOD AND APPARATUS FOR MEASURING PARTICLES
An apparatus for measuring contamination on a critical surface of a part is provided. A vessel for mounting the part is provided. An inert gas source is in fluid connection with the vessel and adapted to provide an inert gas to the vessel. At least one diffuser receives the inert gas from the vessel...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | An apparatus for measuring contamination on a critical surface of a part is provided. A vessel for mounting the part is provided. An inert gas source is in fluid connection with the vessel and adapted to provide an inert gas to the vessel. At least one diffuser receives the inert gas from the vessel, wherein the critical surface of the part is exposed to the inert gas when the part is mounted in the vessel. At least one analyzer is adapted to receive inert gas from the at least one diffuser and measures contaminants in the inert gas.
提供了一种用于测量部件的关键表面上的污染的设备。提供了用于安装所述部件的容器。惰性气体源与所述容器流体连接且适用于提供惰性气体到所述容器。至少一个扩散器接收来自所述容器的所述惰性气体,其中当所述部件安装在所述容器中时,所述部件的所述关键表面暴露于所述惰性气体。至少一个分析器适用于接收来自所述至少一个扩散器的所述惰性气体且测量所述惰性气体中的污染物。 |
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