Reflective maskless laser direct-writing exposure machine

The invention provides a reflective maskless laser direct-writing exposure machine, which is provided with a laser exposure device, and the laser exposure device comprises a plurality of exposure light sources, a plurality of focusing lenses, a reflective scanner and a compensation lens. The focusing lenses are used for focusing the exposure light beams output by the exposure light sources to a photosensitive layer of a substrate to be exposed. The reflective scanner is provided with a rotatable polygon prism, and a plurality of reflection facets of the polygon prism are used for reflecting the exposure light beams emitted by the focusing lenses to the substrate to be exposed. The surface, facing the polygon prism, of the compensation lens is a convex arc surface, the surface, facing the substrate to be exposed, of the compensation lens is a plane, and the exposure light beams emitted from the polygon prism are incident from the convex arc surface and emitted to the photosensitive layer of the substrate to be