Lodging-resistant and stable-yield cultivation method for wheat
The invention discloses a lodging-resistant and stable-yield cultivation method for wheat. The cultivation method is managed according to a conventional planting method, wheat single-grain sowing is adopted during sowing, the row spacing between seeds is 10 cm, and the plant spacing is 8-10 cm; sowi...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a lodging-resistant and stable-yield cultivation method for wheat. The cultivation method is managed according to a conventional planting method, wheat single-grain sowing is adopted during sowing, the row spacing between seeds is 10 cm, and the plant spacing is 8-10 cm; sowing with enough moisture is carried out, the sowing depth is 3-5 cm, and pressing is carried out after sowing; watering and topdressing are carried out in time when the number of groups in the wheat reviving period is less than 600,000; when the the number of groups in the wheat reviving period is 600,000-1,000,000, watering and topdressing are carried out at the early jointing stage; and when the number of groups in the wheat reviving period is more than one million, watering and topdressing areconducted in the middle and later periods of jointing. By optimizing the field configuration, reducing the wheat seeding rate and improving the field microclimate, the wheat resistance, especially the lodging resistance, is |
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