Non-selective wet etching method of multilayer material and application thereof

The invention relates to the technical field of micromachining wet etching, and particularly discloses a non-selective wet etching method of a multilayer material and application thereof. According tothe method, a step-by-step corrosion method is adopted, a substrate of a multi-layer structure is co...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YAO WENGANG, DONG FENGXIN, ZHAO RUN, WU YANQING, CHE XIANGHUI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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