METHOD FOR CLEANING SUBSTRATE

The embodiment of the invention relates to a method for cleaning a substrate. A method for cleaning a substrate includes receiving a photomask substrate comprising a multilayered reflective structuredisposed over a surface of the photomask substrate, a capping layer disposed on the multilayered reflective structure and an absorber, wherein the photomask substrate has a plurality of conductive nanoparticles disposed over the surface; applying a first mixture comprising a SC1 solution, a DI water and O3 to the photomask substrate to remove the conductive nanoparticles; and applying a DI water to rinse the photomask substrate. A removal rate of the conductive nanoparticles is greater than approximately 90%. 本发明实施例涉及一种用于清洗衬底的方法，所述方法包含：接纳光罩衬底，其包括经安置于所述光罩衬底的表面上方的多层反射式结构、经安置于所述多层反射式结构上的覆盖层，及吸收器，其中所述光罩衬底具有经安置于所述表面上方的多个导电纳米颗粒；将包括SC1溶液、DI水及O3的第一混合物施覆到所述光罩衬底以移除所述导电纳米颗粒；及施覆DI水以冲洗所述光罩衬底。所述导电纳米颗粒的移除速率大于约90％。