DEVICE FOR COATING A SUBSTRATE WITH A CARBON-CONTAINING COATING

The invention relates to a device for depositing graphene, carbon nano-tubes or other, in particular carbon-contained coatings on a strip-shaped continuous substrate (2) which enters a reactor housing(1) through an inlet opening (12) and is guided through an outlet opening (12') which emerges f...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	PERRY MORGAN, JOUVRAY ALEXANDRE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACTUATING-FLOATS BLASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COCKS CYLINDERS DEVICES FOR VENTING OR AERATING DIFFUSION TREATMENT OF METALLIC MATERIAL ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MECHANICAL ENGINEERING METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PISTONS SEALINGS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TAPS THEIR RELEVANT APPARATUS THERMAL INSULATION IN GENERAL TRANSPORTING VALVES WEAPONS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The invention relates to a device for depositing graphene, carbon nano-tubes or other, in particular carbon-contained coatings on a strip-shaped continuous substrate (2) which enters a reactor housing(1) through an inlet opening (12) and is guided through an outlet opening (12') which emerges from the reactor housing (1) and which is transported in a transport direction from the inlet opening (12) through a process area (5) tempered by a tempering device (8) and arranged in the reactor housing (1). According to the invention, heat-transport-inhibiting means (14, 15, 16, 17) are arranged between the process area (5) and the inlet opening and/or the outlet opening (12') by means of which a heat transport from the process area (5) is reduced from the inlet opening (12) or the outlet opening(12') is reduced. Also guide elements (11) are provided in order to guide the substrate (2) into regions directly adjacent to the openings (12, 12'). 本发明涉及一种用于在带状的连续的基底(2)上沉积石墨烯、碳纳米管或其它尤其含碳的层的设备，所述基底(2)通过入口(12)进入反应器壳体(1)并且通过出口