Precision etching hidden anti-counterfeiting process

The invention particularly relates to a precision etching hidden type anti-counterfeiting process. The precision etching hidden type anti-counterfeiting process is characterized by comprising the following steps: 1) a mould pressing coating coats a PET base film; 2) holographic laser is stamped on the surface of the mould pressing coating to form a holographic laser layer; 3) vacuum aluminizing isperformed, wherein the thickness of an whole aluminum layer is controlled at 300-400A; 4) a protective coating is printed on a non-etched part of an aluminized surface; 5) a supersaturated calcium oxide solution is configured in a reaction tank; and 6) the aluminum layer is precisely etched, the temperature of the reaction tank is controlled to be 50-60 DEG C, the speed is 60-70 m/min, the retention time of a film belt in the reaction tank is controlled to be 10-15 seconds, the temperature of an oven is set to be 80 DEG C, drying is performed to obtain a finished product, the thickness of thealuminum layer at a windo