POSITION SENSOR

The invention provides a position sensor (300) which comprises an optical system (305,306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A p...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	GOORDEN SEBASTIANUS A, DEN BOEF ARIE J, AKBULUT DUYGU, POLO ALESSANDRO, AKKERMANS JOHANNES A G, HUISMAN SIMON R
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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