POSITION SENSOR

The invention provides a position sensor (300) which comprises an optical system (305,306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A p...

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Bibliographische Detailangaben
Hauptverfasser:	GOORDEN SEBASTIANUS A, DEN BOEF ARIE J, AKBULUT DUYGU, POLO ALESSANDRO, AKKERMANS JOHANNES A G, HUISMAN SIMON R
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention provides a position sensor (300) which comprises an optical system (305,306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first selected radiation wavelength and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model. 本发明提供了一种位置传感器(300)，包括被配置为向衬底(307)提供测量辐射(304)的光学系统(305，306)。光学系统被布置为接收由设置在衬底上的标记(308)衍射的辐射(309)的至少一部分。应用处理器(313)以从接收到的辐射中得出至少一个位置敏感信号(312)。测量辐射包括至少第一选定辐射波长和第二选定辐射波长。至少第一辐射波长和第二辐射波长的选择基于位置误差摆动曲线模型。