Self-cleaning porous vacuum chuck and preparation method thereof

The invention belongs to the technical field of semiconductor manufacturing, and particularly relates to a self-cleaning porous vacuum chuck and a preparation method thereof. The self-cleaning porousvacuum chuck comprises a base and a porous metal adsorption plate arranged on the base, a sinking tab...

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Bibliographische Detailangaben
Hauptverfasser: LIU MENG, SONG YUNYUN, SUN ZHENGBIN, PEI YAXING, ZHANG XIN, LIU XUN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention belongs to the technical field of semiconductor manufacturing, and particularly relates to a self-cleaning porous vacuum chuck and a preparation method thereof. The self-cleaning porousvacuum chuck comprises a base and a porous metal adsorption plate arranged on the base, a sinking table is arranged in the middle of the base, and the porous metal adsorption plate is clamped in the sinking table; an air suction hole penetrating through the base is formed in the middle of a sinking table of the base, a crossed groove and a plurality of concentric annular grooves extending vertically downwards are formed in the upper surface of the sinking table, and the crossed groove penetrates through the annular grooves and the air suction hole. According to the porous vacuum metal suctioncup, the PTFE anti-sticking coatings are deposited on the surfaces of the criss-cross channels in the porous metal adsorption plate and the ventilation grooves in the cavity of the suction cup base, and the problems that micro