MICRO LIGHT EMITTING DIODE ARRAY LITHOGRAPHY

A lithography apparatus is described having a substrate scanning system configured to scan a substrate, a pattern generator configured receive input signals and produce output signals related to a pattern and a light source connected to the pattern generator, wherein the light source is at least one...

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Bibliographische Detailangaben
1. Verfasser:	MARKLE DAVID
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A lithography apparatus is described having a substrate scanning system configured to scan a substrate, a pattern generator configured receive input signals and produce output signals related to a pattern and a light source connected to the pattern generator, wherein the light source is at least one array of micro light emitting diodes, wherein the array is configured to receive the signals from the pattern generator and repeat the pattern produced by the pattern generator. 描述一种平版印刷术设备，具有：基板扫描系统，经配置以扫描基板；图案发生器，经配置以接收输入信号和产生输出信号，所述输出信号与图案相关；和光源，所述光源连接到所述图案发生器，其中所述光源是至少一个微发光二极管阵列，其中所述阵列经配置以接收来自所述图案发生器的所述信号并重复由所述图案发生器产生的所述图案。