Advanced process control method and system of VT-BS model and semiconductor equipment

The invention provides an advanced process control method and system of a VT-BS model and semiconductor equipment. The advanced process control method comprises the following steps: providing global VT-BS path configuration, global VT-BS furnace tube Recipe configuration and global VT-BS furnace tube ChargeRule configuration; according to the global VT-BS path configuration, the global VT-BS furnace tube Recipe configuration and the global VT-BS furnace tube ChargeRule configuration, performing batch grouping on a plurality of Lots to be subjected to batch grouping through a VT-BS path combination configuration algorithm to obtain VT-BS path combination, VT-BS Batch and VT-BS Path information of Wafer; on the basis of whether the Wafer is in the VT-BS Batch in the activated state or not, batching Lots for preparing VT injection operation, and carrying out VT Implant operation; and according to the VT-BS Batch and the current furnace tube Recipe information, determining BoatSlot of Wafer in all Lots for prepar