GAMMA RAY GENERATOR

One of gamma ray lithography systems includes a gamma ray generator and a wafer stage. The gamma ray generator is configured to generate a substantially uniform gamma ray. The gamma ray generator includes a plurality of gamma ray sources and a rotational carrier. The rotational carrier is configured...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ZHUANG GUOSHENG, ZHOU YOUHUA
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:One of gamma ray lithography systems includes a gamma ray generator and a wafer stage. The gamma ray generator is configured to generate a substantially uniform gamma ray. The gamma ray generator includes a plurality of gamma ray sources and a rotational carrier. The rotational carrier is configured to hold the gamma ray sources and rotate along a rotational axis. The wafer stage is disposed belowthe gamma ray generator and configured to secure a wafer. 伽马射线光刻系统中的一者包括伽马射线产生器及晶片平台。伽马射线产生器被配置成产生实质上均匀的伽马射线。伽马射线产生器包括多个伽马射线源及旋转载具。旋转载具被配置成保持伽马射线源并沿旋转轴线进行旋转。晶片平台设置在所述伽马射线产生器下方且被配置成对晶片进行固定。