SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING

A method for thermal management of reticles for conducting an exposure process includes operations. A default state of a reticle is selected based on given data, where the given data includes overlayvalues of a plurality of processed semiconductor workpieces and temperature profiles of the reticle c...

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Bibliographische Detailangaben
Hauptverfasser:	YANG YUELIN, LIAO QIHONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method for thermal management of reticles for conducting an exposure process includes operations. A default state of a reticle is selected based on given data, where the given data includes overlayvalues of a plurality of processed semiconductor workpieces and temperature profiles of the reticle correlated to the processed semiconductor workpieces. The reticle is regulated to reach the defaultstate before using the reticle to perform the exposure process. 一种对用于实施曝光工艺的掩模版进行热管理的方法包括多个操作。基于给定数据选择掩模版的默认状态，其中给定数据包括多个加工过的半导体工件的叠对值及与加工过的半导体工件相关联的掩模版的温度分布。在使用掩模版执行曝光工艺之前，对掩模版进行调节以达到默认状态。