SUBSTRATE PROCESSING CHAMBER WITH SHOWERHEAD HAVING COOLED FACEPLATE

A showerhead for a substrate processing chamber includes: inner walls; an inner plenum between the inner walls; a faceplate having a first surface and a second surface that is opposite the first surface; holes through the faceplate that extend from the first surface to the second surface; a first inlet that is fluidly connected to the inner plenum; outer walls; a first outer plenum between the inner walls and the outer walls; a second outer plenum between the inner walls and the outer walls; and coolant channels that: fluidly connect the first outer plenum with the second outer plenum; are located within the faceplate between the first and second surfaces; and are fluidly isolated from the holes. The showerhead also includes a second inlet that is fluidly connected to the first outer plenum. 一种用于衬底处理室的喷头包含：内壁；内充气腔，其位于所述内壁之间；面板，其具有第一表面与第二表面，所述第二表面与所述第一表面相反；穿过所述面板的孔，其从所述第一表面延伸到所述第二表面；第一入口，其与所述内充气腔流体地连接；外壁；第一外充气腔，其位于所述内壁与所述外壁之间；第二外充气腔，其位于所述内壁与所述外壁之间；以及冷却剂通道，其：使所述第一外充气腔与所述第二外充气腔流体地连接；设置在所述面板内且在所述第一与第二表面之间；并且与所述孔流