CHEMICAL VAPOR DEPOSITION SHOWER HEAD FOR UNIFORM GAS DISTRIBUTION
A Chemical Vapor Deposition (CVD) tool providing more even flow and distribution of reagent gasses over a substrate. The CVD tool includes a processing chamber and a shower head. The shower head includes a gas dispensing surface having multiple hole patterns that are preferably, but not exclusively,...
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| creator | WILTSE JOHN MICHAEL MADSEN ERIC SELEP MICHAEL JOHN BORTH ANDREW JAMES SLEVIN DAMIEN MARTIN |
| description | A Chemical Vapor Deposition (CVD) tool providing more even flow and distribution of reagent gasses over a substrate. The CVD tool includes a processing chamber and a shower head. The shower head includes a gas dispensing surface having multiple hole patterns that are preferably, but not exclusively, non-symmetrical patterns that mitigate or eliminate lines or symmetry. Such hole patterns include are a variety of different types of spirals or close approximations thereof, include, but are not limited to, Archimedean, Vogel or Fermat spirals.
化学气相沉积(CVD)工具在衬底上方提供更为均匀的试剂气体的流动和分配。CVD工具包含处理室和喷头。喷头包含具有多个孔图案的气体分配表面，这些孔图案优选为(但非排他性地)减少或消除线条或对称性的非对称图案。这些孔图案包含各种不同类型的螺线或其近似物，其包含(但不限于)阿基米德螺线、伏格螺线或费马螺线。 |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN112262229A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN112262229A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN112262229A3</originalsourceid><addsrcrecordid>eNrjZHBy9nD19XR29FEIcwzwD1JwcQ3wD_YM8fT3Uwj28A93DVLwcHV0UXADSoX6eQIpXwV3x2AFF8_gkCBPp1CQQh4G1rTEnOJUXijNzaDo5hri7KGbWpAfn1pckJicmpdaEu_sZ2hoZGRmZGRk6WhMjBoACTUrRw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CHEMICAL VAPOR DEPOSITION SHOWER HEAD FOR UNIFORM GAS DISTRIBUTION</title><source>esp@cenet</source><creator>WILTSE JOHN MICHAEL ; MADSEN ERIC ; SELEP MICHAEL JOHN ; BORTH ANDREW JAMES ; SLEVIN DAMIEN MARTIN</creator><creatorcontrib>WILTSE JOHN MICHAEL ; MADSEN ERIC ; SELEP MICHAEL JOHN ; BORTH ANDREW JAMES ; SLEVIN DAMIEN MARTIN</creatorcontrib><description>A Chemical Vapor Deposition (CVD) tool providing more even flow and distribution of reagent gasses over a substrate. The CVD tool includes a processing chamber and a shower head. The shower head includes a gas dispensing surface having multiple hole patterns that are preferably, but not exclusively, non-symmetrical patterns that mitigate or eliminate lines or symmetry. Such hole patterns include are a variety of different types of spirals or close approximations thereof, include, but are not limited to, Archimedean, Vogel or Fermat spirals.
化学气相沉积(CVD)工具在衬底上方提供更为均匀的试剂气体的流动和分配。CVD工具包含处理室和喷头。喷头包含具有多个孔图案的气体分配表面，这些孔图案优选为(但非排他性地)减少或消除线条或对称性的非对称图案。这些孔图案包含各种不同类型的螺线或其近似物，其包含(但不限于)阿基米德螺线、伏格螺线或费马螺线。</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210122&DB=EPODOC&CC=CN&NR=112262229A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210122&DB=EPODOC&CC=CN&NR=112262229A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WILTSE JOHN MICHAEL</creatorcontrib><creatorcontrib>MADSEN ERIC</creatorcontrib><creatorcontrib>SELEP MICHAEL JOHN</creatorcontrib><creatorcontrib>BORTH ANDREW JAMES</creatorcontrib><creatorcontrib>SLEVIN DAMIEN MARTIN</creatorcontrib><title>CHEMICAL VAPOR DEPOSITION SHOWER HEAD FOR UNIFORM GAS DISTRIBUTION</title><description>A Chemical Vapor Deposition (CVD) tool providing more even flow and distribution of reagent gasses over a substrate. The CVD tool includes a processing chamber and a shower head. The shower head includes a gas dispensing surface having multiple hole patterns that are preferably, but not exclusively, non-symmetrical patterns that mitigate or eliminate lines or symmetry. Such hole patterns include are a variety of different types of spirals or close approximations thereof, include, but are not limited to, Archimedean, Vogel or Fermat spirals.
化学气相沉积(CVD)工具在衬底上方提供更为均匀的试剂气体的流动和分配。CVD工具包含处理室和喷头。喷头包含具有多个孔图案的气体分配表面，这些孔图案优选为(但非排他性地)减少或消除线条或对称性的非对称图案。这些孔图案包含各种不同类型的螺线或其近似物，其包含(但不限于)阿基米德螺线、伏格螺线或费马螺线。</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBy9nD19XR29FEIcwzwD1JwcQ3wD_YM8fT3Uwj28A93DVLwcHV0UXADSoX6eQIpXwV3x2AFF8_gkCBPp1CQQh4G1rTEnOJUXijNzaDo5hri7KGbWpAfn1pckJicmpdaEu_sZ2hoZGRmZGRk6WhMjBoACTUrRw</recordid><startdate>20210122</startdate><enddate>20210122</enddate><creator>WILTSE JOHN MICHAEL</creator><creator>MADSEN ERIC</creator><creator>SELEP MICHAEL JOHN</creator><creator>BORTH ANDREW JAMES</creator><creator>SLEVIN DAMIEN MARTIN</creator><scope>EVB</scope></search><sort><creationdate>20210122</creationdate><title>CHEMICAL VAPOR DEPOSITION SHOWER HEAD FOR UNIFORM GAS DISTRIBUTION</title><author>WILTSE JOHN MICHAEL ; MADSEN ERIC ; SELEP MICHAEL JOHN ; BORTH ANDREW JAMES ; SLEVIN DAMIEN MARTIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN112262229A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>WILTSE JOHN MICHAEL</creatorcontrib><creatorcontrib>MADSEN ERIC</creatorcontrib><creatorcontrib>SELEP MICHAEL JOHN</creatorcontrib><creatorcontrib>BORTH ANDREW JAMES</creatorcontrib><creatorcontrib>SLEVIN DAMIEN MARTIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WILTSE JOHN MICHAEL</au><au>MADSEN ERIC</au><au>SELEP MICHAEL JOHN</au><au>BORTH ANDREW JAMES</au><au>SLEVIN DAMIEN MARTIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CHEMICAL VAPOR DEPOSITION SHOWER HEAD FOR UNIFORM GAS DISTRIBUTION</title><date>2021-01-22</date><risdate>2021</risdate><abstract>A Chemical Vapor Deposition (CVD) tool providing more even flow and distribution of reagent gasses over a substrate. The CVD tool includes a processing chamber and a shower head. The shower head includes a gas dispensing surface having multiple hole patterns that are preferably, but not exclusively, non-symmetrical patterns that mitigate or eliminate lines or symmetry. Such hole patterns include are a variety of different types of spirals or close approximations thereof, include, but are not limited to, Archimedean, Vogel or Fermat spirals.
化学气相沉积(CVD)工具在衬底上方提供更为均匀的试剂气体的流动和分配。CVD工具包含处理室和喷头。喷头包含具有多个孔图案的气体分配表面，这些孔图案优选为(但非排他性地)减少或消除线条或对称性的非对称图案。这些孔图案包含各种不同类型的螺线或其近似物，其包含(但不限于)阿基米德螺线、伏格螺线或费马螺线。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | CHEMICAL VAPOR DEPOSITION SHOWER HEAD FOR UNIFORM GAS DISTRIBUTION |
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