CHEMICAL VAPOR DEPOSITION SHOWER HEAD FOR UNIFORM GAS DISTRIBUTION

A Chemical Vapor Deposition (CVD) tool providing more even flow and distribution of reagent gasses over a substrate. The CVD tool includes a processing chamber and a shower head. The shower head includes a gas dispensing surface having multiple hole patterns that are preferably, but not exclusively, non-symmetrical patterns that mitigate or eliminate lines or symmetry. Such hole patterns include are a variety of different types of spirals or close approximations thereof, include, but are not limited to, Archimedean, Vogel or Fermat spirals. 化学气相沉积(CVD)工具在衬底上方提供更为均匀的试剂气体的流动和分配。CVD工具包含处理室和喷头。喷头包含具有多个孔图案的气体分配表面，这些孔图案优选为(但非排他性地)减少或消除线条或对称性的非对称图案。这些孔图案包含各种不同类型的螺线或其近似物，其包含(但不限于)阿基米德螺线、伏格螺线或费马螺线。