Uniform electric field assisted nanoimprint forming device and method

The invention relates to a uniform electric field assisted nanoimprint forming device and method. The method comprises the following steps: adjusting voltage between an upper electrode plate and a lower electrode plate of the imprinting device to control uniform electric field force generated betwee...

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Hauptverfasser: LIU AO, LU FAXIANG, XU HONGYU, DAI DE'EN, LIN JIEQIONG, KANG MINGSHUO, XU ZHENPAN, FENG KAITUO, ZHANG ZHAOJIE, YAN JIAXUAN, YI ZHENGFA, DUAN XINGXIN, GU YAN, CHEN SI, LI XIANYAO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention relates to a uniform electric field assisted nanoimprint forming device and method. The method comprises the following steps: adjusting voltage between an upper electrode plate and a lower electrode plate of the imprinting device to control uniform electric field force generated between the electrode plates, and imprinting by taking the uniform electric field force as imprinting force, and repeatedly applying equal adjustable voltage in positive and negative directions between the two electrode plates during demolding to form forward and reverse uniform electric field force and serving as demolding force, so that the imprinting mold is separated from the substrate. Uniform electric field force is adopted as impressing force, so that a microstructure on an impressing mold canbe better transferred to a substrate under the action of uniform force, meanwhile, repeated uniform electric field force in the positive direction and the negative direction is adopted as demolding force, the integrity of a p