Vacuum chamber and substrate processing apparatus

The invention discloses a vacuum chamber and a substrate processing apparatus. The vacuum chamber is configured by arranging a plurality of blocks having an annular open space when viewed from the conveyance direction of the substrate, and the vacuum chamber is capable of switching an atmosphere of an internal space formed by communicating the open spaces of the plurality of blocks to an atmospheric pressure atmosphere and a vacuum atmosphere. The vacuum chamber includes: a first block that is one of the plurality of blocks; a second block, which is one of the plurality of blocks, has a grooveextending in a direction crossing the conveyance direction and formed on an inner lower surface of the open space, and is connected and fixed to the first block by a sealing member; a base member extending in an extending direction of the groove and fitted into the groove; and a plurality of substrate support pins having a support end in contact with the substrate and a fixed end on an opposite side of the support end an