Method for manufacturing ITO with specified refractive index

The invention discloses a method for manufacturing an ITO with a specified refractive index, which comprises the following steps of: calculating the ITO refractive index under the current coating process through a photometric refractive index calculation method provided by a patent, comparing the re...

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Hauptverfasser: FANG FENGJUN, CHEN DUO, HONG MENG, TIAN BO, GUI ZHENGXING, CHENG ZHIMIN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a method for manufacturing an ITO with a specified refractive index, which comprises the following steps of: calculating the ITO refractive index under the current coating process through a photometric refractive index calculation method provided by a patent, comparing the refractive indexes of adjacent media, and enabling the ITO refractive index to be equal to the refractive index of an adjacent material by adjusting the ITO coating process, thereby solving the problem of low refractive index caused by different ITO surface resistances in the prior art. In other words, the IM must be changed along with different ITO film thicknesses due to different ITO film thicknesses, so that the design workload and the production cost of the IM are increased, the cost of frequent design and production debugging of the IM is saved, the anti-reflection technology is more popularized in the field of display, and the readability of the display screen in the sun is better due to low reflection. 本发明公开了