Lithographic apparatus and method for detecting pupil plane transmittance of lithographic apparatus

The invention provides a lithographic apparatus and a pupil plane transmittance detection method of the lithographic apparatus. According to a phase mask with the sub-beam energy constant, the incident energy of the corresponding sub-beam or the incident energy ratio of the sub-beam is obtained, and the detection device is also integrated in the photoetching equipment, so the detection device canbe used for obtaining the emergent energy of the sub-beam on line, and the detection result of the pupil plane transmittance can be obtained. Namely, the photoetching equipment disclosed by the invention integrates a pupil plane transmittance detection function, so the detection process can be executed on line, the detection mode is convenient, and the detection time can be effectively shortened. 本发明提供了一种光刻设备以及光刻设备的瞳面透过率的检测方法。根据具有子光束能量常数的相位掩模版，获取对应的子光束入射能量或者获取子光束的入射能量比值，并且在光刻设备中还集成有检测装置，以利用检测装置可以实现在线获取子光束的出射能量，进而可以得到瞳面透过率的检测结果。即，本发明中的光刻设备集成有瞳面透过率检测功能，从而可以在线执行检测过程，不仅其检测方式便利，并且可有效缩减检测时长。