Method for preparing IBC solar cell with N-type FSF structure based on photoetching mask method

The invention provides a method for preparing an IBC solar cell of an N-type FSF structure based on a photoetching mask method. A silicon wafer is sequentially subjected to a damage layer removing step, a selective emitter manufacturing step, a texturing step, a surface field manufacturing step, an...

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Bibliographische Detailangaben

Hauptverfasser:	HU LINNA, GUO YONGGANG, SONG ZHICHENG, MA JIKUI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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