Method and device for realizing high-flux parallel laser scanning direct-writing photoetching

The invention provides a method for realizing high-flux parallel laser scanning direct-writing photoetching. The method comprises the following steps of: 1) generating a high-flux parallel writing light beam consisting of a plurality of sub light beams; 2) independently controlling the on-off of each sub light beam in the high-flux parallel writing light beam; 3) focusing the high-flux parallel writing light beam on a photoetching sample; 4) realizing small-area direct-writing photoetching by matching horizontal scanning of high-flux parallel writing light beams with vertical movement of the photoetching sample; and 5) performing large-range three-dimensional movement on the photoetching sample to realize three-dimensional direct-writing photoetching. The invention also provides a device for realizing high-flux parallel laser scanning direct-writing photoetching. Compared with the prior art, the method has the advantages of being high in direct-writing photoetching processing efficiency, high in processing sp