ATOMIC BEAM GENERATION DEVICE, JOINING DEVICE, SURFACE MODIFICATION METHOD AND JOINING METHOD

The atomic beam generation device 10 comprises: a cathode 20 in the form of a case having an emission surface 22 with an irradiation opening 23 through which an atomic beam can be emitted; an anode 40disposed inside the cathode 20 and generating a plasma with the cathode 20; and magnetic field gener...

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Hauptverfasser: SAKURAI JUNPEI, NAGAE TOMOKI, HATA SEIICHI, HIRAI YUUKI, TSUJI HIROYUKI, AKAO TAKAYOSHI, TAKAHASHI TOMONORI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The atomic beam generation device 10 comprises: a cathode 20 in the form of a case having an emission surface 22 with an irradiation opening 23 through which an atomic beam can be emitted; an anode 40disposed inside the cathode 20 and generating a plasma with the cathode 20; and magnetic field generation units 61, 62 comprising a first magnetic field generation unit 61 for generating a first magnetic field B1 and a second magnetic field generation unit 62 for generating a second magnetic field B2, wherein the first magnetic field and the second magnetic field are generated inside the cathode20 in parallel to the emission surface 22 such that the orientation of the first magnetic field is in the leftward direction and the orientation of the second magnetic field is in the rightward direction when viewed from the emission surface 22 side with the first magnetic field being positioned above the second magnetic field, and cations generated inside the cathode 20 are guided to the emissionsurface. 原子束产生装置(10)具备:阴极(