APPARATUS FOR GASEOUS BYPRODUCT ABATEMENT AND FORELINE CLEANING

Embodiments disclosed herein include an abatement system and method for abating compounds produced in semiconductor processes. The abatement system includes a remote plasma source for generating an oxidizing plasma for treating exhaust gases from a deposition process performed in the processing chamber, the treatment assisting with the trapping particles in an exhaust cooling apparatus. The remoteplasma source then generates a cleaning plasma for treating exhaust gases from a cleaning process performed in the processing chamber, the cleaning plasma reacting with the trapped particles in the exhaust cooling apparatus and cleaning the exhaust cooling apparatus. 本文披露的实施方式包括一种用于消除在半导体工艺中产生的化合物的消除系统和方法。所述消除系统包括用于产生氧化等离子体的远程等离子体源，所述氧化等离子体用于处理来自在处理腔室中执行的沉积工艺的排放气体，所述处理辅助在排放冷却设备中捕获颗粒。远程等离子体源随后产生清洁等离子体，所述清洁等离子体用于处理来自在处理腔室中执行的清洁工艺的排放气体，所述清洁等离子体与排气冷却设备中的捕获颗粒反应并且清洁排气冷却设备。