VACUUM DEPOSITION APPARATUS AND METHODs FOR PRODUCING VAPOR DEPOSITED FILM AND ORGANIC ELECTRONIC DEVICE

A vacuum deposition apparatus, and methods for producing a vapor deposited film and an organic electronic device are provided. An object of the present invention is to provide the vacuum deposition apparatus capable of forming a layer with a desired pattern and high accuracy by preventing thermal deformation in vapor deposition. The vacuum deposition apparatus is provided with an evaporation source (2) in an evaporation chamber (1) for performing deposition on a substrate through a mask, and an evaporation source moving device for relatively moving the evaporation source (2) to the substrate when performing deposition or a substrate moving device for relatively moving the substrate to the deposition source when performing deposition are installed in a deposition chamber (1). Before starting deposition on the substrate, the evaporation source moving device or the substrate moving device is configured to perform preheating on the mask by using the evaporation source (2). 本发明提供一种真空蒸镀装置、蒸镀膜的制造方法和有机电子器件的制造方法，该真空蒸镀