Interface mismatch degree calculation method and device

The invention provides an interface mismatch degree calculation method and device. The method comprises the steps that a two-phase crystal structure model is established; selecting a two-phase crystalface according to the two-phase crystal structure model; selecting a two-phase crystal orientation a...

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Hauptverfasser: ZHANG ZHIBO, WEN LITAO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention provides an interface mismatch degree calculation method and device. The method comprises the steps that a two-phase crystal structure model is established; selecting a two-phase crystalface according to the two-phase crystal structure model; selecting a two-phase crystal orientation according to the two-phase crystal face; according to the two-phase crystal orientation, obtaining adistance between atoms of the two-phase corresponding crystal orientation and an included angle between atoms of the two-phase corresponding crystal orientation; and calculating the interface mismatch degree according to the distance between the two corresponding crystal orientation atoms and the included angle between the two corresponding crystal orientation atoms. By selecting the crystal faces and the crystal orientations of the two-phase crystals, the atomic distances of the corresponding crystal orientations and the atomic included angles of the corresponding crystal orientations are obtained, the interface mism