Exposure method and exposure system

The invention provides an exposure method and an exposure system. The exposure method is used for exposing a plurality of substrates placed on a platform at the same time, and comprises the followingsteps: acquiring graphic coordinates of a plurality of mark patterns on the substrates in a graphic coordinate system of the substrates; moving the camera and the platform; when the camera captures the marking patterns, obtaining world coordinates of the moving position of the camera in the world coordinate system and a first moving distance of the platform to determine the world coordinates of each marking pattern; calculating a mapping relationship between a graphic coordinate system and a world coordinate system of the substrate according to the graphic coordinate and the world coordinate of each marking pattern; calculating a mapping relationship between the graphic coordinate systems and the world coordinate systems of all the substrates; performing conversion processing on the exposure pattern according to t