FACILITY AND METHOD FOR LOCALISED SURFACE TREATMENT FOR INDUSTRIAL COMPONENTS

A station (1) for the localised surface treatment of an industrial component (2) to be treated, comprising a system (6) for applying a vacuum in the treatment chamber (5) and the feed and drain circuit (22, 23) making it possible to feed, or drain, the chamber, by virtue of treatment fluid being suc...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: VANHEE LUC, GMUR DANIEL
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A station (1) for the localised surface treatment of an industrial component (2) to be treated, comprising a system (6) for applying a vacuum in the treatment chamber (5) and the feed and drain circuit (22, 23) making it possible to feed, or drain, the chamber, by virtue of treatment fluid being sucked through the feed and drain circuit (22, 23) from the storage vessels (3A, 3B, 3C, 3D,...) to thetreatment chamber (5), when said vacuum is applied, or by virtue of the treatment fluid being returned to the storage vessels (3A, 3B, 3C, 3D,...) by force of gravity when the feed and drain circuit(22, 23) is set to atmospheric pressure. 一种用于要处理的工业工件(2)的局部表面处理的站(1),包括系统(6),该系统用于在处理室(5)和供应与排空回路(22,23)中施加真空,使得当施加所述真空时通过处理流体通过供应与排空回路(22,23)从储存桶(3A,3B,3C,3D,...)被吸到处理室(5)或者当供应与排空回路(22,23)被设置到大气压力时通过处理流体在重力作用下返回到储存桶(3A,3B,3C,3D,...)可以对该室进行供应或排空。