INTEGRATED CIRCUIT DEVICE
An integrated circuit (IC) device includes a fin-type active region extending lengthwise in a first direction, a plurality of nanosheets overlapping each other in a second direction on a fin top surface of the fin-type active region, and a source/drain region on the fin-type active region and facing...
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creator | LEE SEUNGHUN PARK PANKWI SHIN KEOMYOUNG |
description | An integrated circuit (IC) device includes a fin-type active region extending lengthwise in a first direction, a plurality of nanosheets overlapping each other in a second direction on a fin top surface of the fin-type active region, and a source/drain region on the fin-type active region and facing the plurality of nanosheets in the first direction. The plurality of nanosheets include a first nanosheet, which is closest to the fin top surface of the fin-type active region and has a shortest length in the first direction, from among the plurality of nanosheets. The source/drain region includesa source/drain main region and a first source/drain protruding region protruding from the source/drain main region. The first source/drain protruding region protrudes from the source/drain main region toward the first nanosheet and overlaps portions of the plurality of nanosheets in the second direction.
一种集成电路(IC)器件包括:在第一方向上纵向延伸的鳍型有源区;在鳍型有源区的鳍顶表面上在第二方向上彼此交叠的多个纳米片;以及在鳍型有源区上并在第一方向上面向所述多个纳米片的源极/漏极区域。所述多个纳米片包括所述多个纳米片当中最靠近鳍型 |
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一种集成电路(IC)器件包括:在第一方向上纵向延伸的鳍型有源区;在鳍型有源区的鳍顶表面上在第二方向上彼此交叠的多个纳米片;以及在鳍型有源区上并在第一方向上面向所述多个纳米片的源极/漏极区域。所述多个纳米片包括所述多个纳米片当中最靠近鳍型</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201113&DB=EPODOC&CC=CN&NR=111933683A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20201113&DB=EPODOC&CC=CN&NR=111933683A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LEE SEUNGHUN</creatorcontrib><creatorcontrib>PARK PANKWI</creatorcontrib><creatorcontrib>SHIN KEOMYOUNG</creatorcontrib><title>INTEGRATED CIRCUIT DEVICE</title><description>An integrated circuit (IC) device includes a fin-type active region extending lengthwise in a first direction, a plurality of nanosheets overlapping each other in a second direction on a fin top surface of the fin-type active region, and a source/drain region on the fin-type active region and facing the plurality of nanosheets in the first direction. The plurality of nanosheets include a first nanosheet, which is closest to the fin top surface of the fin-type active region and has a shortest length in the first direction, from among the plurality of nanosheets. The source/drain region includesa source/drain main region and a first source/drain protruding region protruding from the source/drain main region. The first source/drain protruding region protrudes from the source/drain main region toward the first nanosheet and overlaps portions of the plurality of nanosheets in the second direction.
一种集成电路(IC)器件包括:在第一方向上纵向延伸的鳍型有源区;在鳍型有源区的鳍顶表面上在第二方向上彼此交叠的多个纳米片;以及在鳍型有源区上并在第一方向上面向所述多个纳米片的源极/漏极区域。所述多个纳米片包括所述多个纳米片当中最靠近鳍型</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJD09AtxdQ9yDHF1UXD2DHIO9QxRcHEN83R25WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hoaGlsbGZhbGjsbEqAEADs0f8A</recordid><startdate>20201113</startdate><enddate>20201113</enddate><creator>LEE SEUNGHUN</creator><creator>PARK PANKWI</creator><creator>SHIN KEOMYOUNG</creator><scope>EVB</scope></search><sort><creationdate>20201113</creationdate><title>INTEGRATED CIRCUIT DEVICE</title><author>LEE SEUNGHUN ; PARK PANKWI ; SHIN KEOMYOUNG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN111933683A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>LEE SEUNGHUN</creatorcontrib><creatorcontrib>PARK PANKWI</creatorcontrib><creatorcontrib>SHIN KEOMYOUNG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEE SEUNGHUN</au><au>PARK PANKWI</au><au>SHIN KEOMYOUNG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>INTEGRATED CIRCUIT DEVICE</title><date>2020-11-13</date><risdate>2020</risdate><abstract>An integrated circuit (IC) device includes a fin-type active region extending lengthwise in a first direction, a plurality of nanosheets overlapping each other in a second direction on a fin top surface of the fin-type active region, and a source/drain region on the fin-type active region and facing the plurality of nanosheets in the first direction. The plurality of nanosheets include a first nanosheet, which is closest to the fin top surface of the fin-type active region and has a shortest length in the first direction, from among the plurality of nanosheets. The source/drain region includesa source/drain main region and a first source/drain protruding region protruding from the source/drain main region. The first source/drain protruding region protrudes from the source/drain main region toward the first nanosheet and overlaps portions of the plurality of nanosheets in the second direction.
一种集成电路(IC)器件包括:在第一方向上纵向延伸的鳍型有源区;在鳍型有源区的鳍顶表面上在第二方向上彼此交叠的多个纳米片;以及在鳍型有源区上并在第一方向上面向所述多个纳米片的源极/漏极区域。所述多个纳米片包括所述多个纳米片当中最靠近鳍型</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | INTEGRATED CIRCUIT DEVICE |
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