INTEGRATED CIRCUIT DEVICE

An integrated circuit (IC) device includes a fin-type active region extending lengthwise in a first direction, a plurality of nanosheets overlapping each other in a second direction on a fin top surface of the fin-type active region, and a source/drain region on the fin-type active region and facing...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LEE SEUNGHUN, PARK PANKWI, SHIN KEOMYOUNG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:An integrated circuit (IC) device includes a fin-type active region extending lengthwise in a first direction, a plurality of nanosheets overlapping each other in a second direction on a fin top surface of the fin-type active region, and a source/drain region on the fin-type active region and facing the plurality of nanosheets in the first direction. The plurality of nanosheets include a first nanosheet, which is closest to the fin top surface of the fin-type active region and has a shortest length in the first direction, from among the plurality of nanosheets. The source/drain region includesa source/drain main region and a first source/drain protruding region protruding from the source/drain main region. The first source/drain protruding region protrudes from the source/drain main region toward the first nanosheet and overlaps portions of the plurality of nanosheets in the second direction. 一种集成电路(IC)器件包括:在第一方向上纵向延伸的鳍型有源区;在鳍型有源区的鳍顶表面上在第二方向上彼此交叠的多个纳米片;以及在鳍型有源区上并在第一方向上面向所述多个纳米片的源极/漏极区域。所述多个纳米片包括所述多个纳米片当中最靠近鳍型