Residual monomer removing device

The present invention provides a residual monomer removal device capable of efficiently removing residual monomers from a chlorinated ethylene-containing resin slurry while preventing the residual monomers from being discharged out of a process. The residual monomer removing device is provided with a cylindrical tower body 4; a plurality of perforated plates 34 provided in the vertical direction inside the tower body; a plurality of chambers (16-21) each formed above the perforated plate with the perforated plate as the bottom surface; slurry introduction pipes 22, 23; a downflow pipe 36 for causing the slurry to sequentially flow downward from the perforated plate of the upper chamber; a steam leading-in pipe 10 arranged at the bottom of the tower body; a condensation device 6 provided atthe upper part of the tower body with a gas discharge port 11 interposed therebetween; a slurry discharge port 24 provided in the lowermost perforated plate; a warm water spraying ring 38 located under the perforated plate.