Negative photosensitive resin composition and application thereof

A negative photosensitive resin composition includes (A) 1 to 20 weight percent of a polysiloxane compound formed by polymerizing a plurality of monomers including siloxane monomers represented by thefollowing formulas (a-1), (a-2) and (a-3); (B) 0.1 wt% to 15 wt% of an unsaturated compound; (C) 1 w...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIN FANSEN, HU DENGGUI, LAN DAJUN, LIU HONGYUAN, ZHANG ZHIYI, ZHAN SHUTING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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