Electrochromic film device with adjustable light performance in visible to mid-infrared bands and preparation method thereof

The invention discloses an electrochromic film device with adjustable light performance in visible to mid-infrared bands and a preparation method thereof, and the preparation method comprises the following steps: S1, selecting a substrate, and carrying out the pretreatment of the substrate; s2, prep...

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Bibliographische Detailangaben
Hauptverfasser:	ZHOU HAN, LIU XIANGHUI, QIAN ZHENLI, FAN TONGXIANG, XU JIANMING, TANG DAOYUAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS THEREFOR METALLURGY NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	The invention discloses an electrochromic film device with adjustable light performance in visible to mid-infrared bands and a preparation method thereof, and the preparation method comprises the following steps: S1, selecting a substrate, and carrying out the pretreatment of the substrate; s2, preparing a high-transmittance conductive layer on the treated substrate; s3, depositing a WO3 layer onthe high-transmittance conducting layer to serve as a color changing layer, continuing to deposit Ta2O5 continues on the WO3 layer to serve as an electrolyte layer, carrying out annealing treatment, and obtaining crystalline WO3; s4, continuously depositing a metal oxide as an ion storage layer, and repeating the step S2 on the basis of the metal oxide to obtain an electrochromic film device, wherein if the substrate is made of the transparent conductive material, the step S3 is directly carried out on the processed substrate. According to the electrochromic film device obtained by the method,the light performance can