White carbon black production high-silicon wastewater zero discharge process and system thereof

The invention relates to a wastewater treatment process, in particular to a white carbon black production high-silicon wastewater zero discharge process. The method comprises the following steps: 1) removing ionic silicon and colloidal silicon in high-silicon wastewater with the pH value of 7.5-8.5...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: CHEN WEI, SHENG FAN, FU LIDE, FANG SHUPENG
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator CHEN WEI
SHENG FAN
FU LIDE
FANG SHUPENG
description The invention relates to a wastewater treatment process, in particular to a white carbon black production high-silicon wastewater zero discharge process. The method comprises the following steps: 1) removing ionic silicon and colloidal silicon in high-silicon wastewater with the pH value of 7.5-8.5 by adopting an electric flocculation method to obtain primary treatment wastewater; 2) treating theprimary treatment wastewater by adopting a silicon removal agent and a coagulant aid to obtain secondary treatment wastewater; 3) treating the secondary treatment wastewater by using an IMF ultrafiltration membrane, a nanofiltration membrane and a reverse osmosis membrane in sequence to obtain clear water. The invention discloses a zero-discharge system for high-silicon wastewater in white carbonblack production. The zero-discharge system is characterized by comprising an electrochemical device, an efficient separator, an IMF ultrafiltration membrane pool, an ultrafiltration water productiontank, a nanofiltration devi
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN111908675A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN111908675A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN111908675A3</originalsourceid><addsrcrecordid>eNqNizEKwkAQRdNYiHqH8QABg6ixlKBYWQmWYTL5yS6u2bCzEvT0RvAAVp_3eH-alDdjI0g4VL6jyrHcqQ--fkq0ozC2NalaZ2WEgTVi4IhAbwRPtVUxHFp8HwJV4q4mfY3Vg6JBgG_myaRhp1j8dpYsT8drcU7R-xLas6BDLItLlmX7Vb7dbQ7rf5oPzlA9nw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>White carbon black production high-silicon wastewater zero discharge process and system thereof</title><source>esp@cenet</source><creator>CHEN WEI ; SHENG FAN ; FU LIDE ; FANG SHUPENG</creator><creatorcontrib>CHEN WEI ; SHENG FAN ; FU LIDE ; FANG SHUPENG</creatorcontrib><description>The invention relates to a wastewater treatment process, in particular to a white carbon black production high-silicon wastewater zero discharge process. The method comprises the following steps: 1) removing ionic silicon and colloidal silicon in high-silicon wastewater with the pH value of 7.5-8.5 by adopting an electric flocculation method to obtain primary treatment wastewater; 2) treating theprimary treatment wastewater by adopting a silicon removal agent and a coagulant aid to obtain secondary treatment wastewater; 3) treating the secondary treatment wastewater by using an IMF ultrafiltration membrane, a nanofiltration membrane and a reverse osmosis membrane in sequence to obtain clear water. The invention discloses a zero-discharge system for high-silicon wastewater in white carbonblack production. The zero-discharge system is characterized by comprising an electrochemical device, an efficient separator, an IMF ultrafiltration membrane pool, an ultrafiltration water productiontank, a nanofiltration devi</description><language>chi ; eng</language><subject>CHEMISTRY ; COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM,RUBIDIUM, CAESIUM, OR FRANCIUM ; INORGANIC CHEMISTRY ; METALLURGY ; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201110&amp;DB=EPODOC&amp;CC=CN&amp;NR=111908675A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201110&amp;DB=EPODOC&amp;CC=CN&amp;NR=111908675A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHEN WEI</creatorcontrib><creatorcontrib>SHENG FAN</creatorcontrib><creatorcontrib>FU LIDE</creatorcontrib><creatorcontrib>FANG SHUPENG</creatorcontrib><title>White carbon black production high-silicon wastewater zero discharge process and system thereof</title><description>The invention relates to a wastewater treatment process, in particular to a white carbon black production high-silicon wastewater zero discharge process. The method comprises the following steps: 1) removing ionic silicon and colloidal silicon in high-silicon wastewater with the pH value of 7.5-8.5 by adopting an electric flocculation method to obtain primary treatment wastewater; 2) treating theprimary treatment wastewater by adopting a silicon removal agent and a coagulant aid to obtain secondary treatment wastewater; 3) treating the secondary treatment wastewater by using an IMF ultrafiltration membrane, a nanofiltration membrane and a reverse osmosis membrane in sequence to obtain clear water. The invention discloses a zero-discharge system for high-silicon wastewater in white carbonblack production. The zero-discharge system is characterized by comprising an electrochemical device, an efficient separator, an IMF ultrafiltration membrane pool, an ultrafiltration water productiontank, a nanofiltration devi</description><subject>CHEMISTRY</subject><subject>COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM,RUBIDIUM, CAESIUM, OR FRANCIUM</subject><subject>INORGANIC CHEMISTRY</subject><subject>METALLURGY</subject><subject>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNizEKwkAQRdNYiHqH8QABg6ixlKBYWQmWYTL5yS6u2bCzEvT0RvAAVp_3eH-alDdjI0g4VL6jyrHcqQ--fkq0ozC2NalaZ2WEgTVi4IhAbwRPtVUxHFp8HwJV4q4mfY3Vg6JBgG_myaRhp1j8dpYsT8drcU7R-xLas6BDLItLlmX7Vb7dbQ7rf5oPzlA9nw</recordid><startdate>20201110</startdate><enddate>20201110</enddate><creator>CHEN WEI</creator><creator>SHENG FAN</creator><creator>FU LIDE</creator><creator>FANG SHUPENG</creator><scope>EVB</scope></search><sort><creationdate>20201110</creationdate><title>White carbon black production high-silicon wastewater zero discharge process and system thereof</title><author>CHEN WEI ; SHENG FAN ; FU LIDE ; FANG SHUPENG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN111908675A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>CHEMISTRY</topic><topic>COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM,RUBIDIUM, CAESIUM, OR FRANCIUM</topic><topic>INORGANIC CHEMISTRY</topic><topic>METALLURGY</topic><topic>TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE</topic><toplevel>online_resources</toplevel><creatorcontrib>CHEN WEI</creatorcontrib><creatorcontrib>SHENG FAN</creatorcontrib><creatorcontrib>FU LIDE</creatorcontrib><creatorcontrib>FANG SHUPENG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHEN WEI</au><au>SHENG FAN</au><au>FU LIDE</au><au>FANG SHUPENG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>White carbon black production high-silicon wastewater zero discharge process and system thereof</title><date>2020-11-10</date><risdate>2020</risdate><abstract>The invention relates to a wastewater treatment process, in particular to a white carbon black production high-silicon wastewater zero discharge process. The method comprises the following steps: 1) removing ionic silicon and colloidal silicon in high-silicon wastewater with the pH value of 7.5-8.5 by adopting an electric flocculation method to obtain primary treatment wastewater; 2) treating theprimary treatment wastewater by adopting a silicon removal agent and a coagulant aid to obtain secondary treatment wastewater; 3) treating the secondary treatment wastewater by using an IMF ultrafiltration membrane, a nanofiltration membrane and a reverse osmosis membrane in sequence to obtain clear water. The invention discloses a zero-discharge system for high-silicon wastewater in white carbonblack production. The zero-discharge system is characterized by comprising an electrochemical device, an efficient separator, an IMF ultrafiltration membrane pool, an ultrafiltration water productiontank, a nanofiltration devi</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN111908675A
source esp@cenet
subjects CHEMISTRY
COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM,RUBIDIUM, CAESIUM, OR FRANCIUM
INORGANIC CHEMISTRY
METALLURGY
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
title White carbon black production high-silicon wastewater zero discharge process and system thereof
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-21T18%3A30%3A36IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CHEN%20WEI&rft.date=2020-11-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN111908675A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true