White carbon black production high-silicon wastewater zero discharge process and system thereof
The invention relates to a wastewater treatment process, in particular to a white carbon black production high-silicon wastewater zero discharge process. The method comprises the following steps: 1) removing ionic silicon and colloidal silicon in high-silicon wastewater with the pH value of 7.5-8.5...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention relates to a wastewater treatment process, in particular to a white carbon black production high-silicon wastewater zero discharge process. The method comprises the following steps: 1) removing ionic silicon and colloidal silicon in high-silicon wastewater with the pH value of 7.5-8.5 by adopting an electric flocculation method to obtain primary treatment wastewater; 2) treating theprimary treatment wastewater by adopting a silicon removal agent and a coagulant aid to obtain secondary treatment wastewater; 3) treating the secondary treatment wastewater by using an IMF ultrafiltration membrane, a nanofiltration membrane and a reverse osmosis membrane in sequence to obtain clear water. The invention discloses a zero-discharge system for high-silicon wastewater in white carbonblack production. The zero-discharge system is characterized by comprising an electrochemical device, an efficient separator, an IMF ultrafiltration membrane pool, an ultrafiltration water productiontank, a nanofiltration devi |
---|