Polycrystalline silicon reduction system and polycrystalline silicon reduction process

The invention discloses a polycrystalline silicon reduction system and a polycrystalline silicon reduction process. The polycrystalline silicon reduction system comprises a reduction furnace, a hot water supply device, a first heat exchanger, a second heat exchanger, a third heat exchanger, a fourth...

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Hauptverfasser: ZHANG SHENGXUE, ZHENG HONGMEI, CHEN GUI'E, YANG YONGLIANG, SHI HEWU
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a polycrystalline silicon reduction system and a polycrystalline silicon reduction process. The polycrystalline silicon reduction system comprises a reduction furnace, a hot water supply device, a first heat exchanger, a second heat exchanger, a third heat exchanger, a fourth heat exchanger and a pipeline mixer, wherein the first heat exchanger is connected with the reduction furnace, the hot water supply device and the second heat exchanger, the second heat exchanger is connected with the reduction furnace, the pipeline mixer and the first heat exchanger, the third heat exchanger is connected with the first heat exchanger and the pipeline mixer, and the fourth heat exchanger is connected with the pipeline mixer and the second heat exchanger. According to the polycrystalline silicon reduction system, through cooperation of the heat exchangers and the hot water supply device, heat in reduction tail gas can be gradually decreased and reasonably utilized in all links of the polycrystallin