Electrostatic chuck device and dry etching machine
The invention provides an electrostatic chuck device and a dry etching machine. The electrostatic chuck device comprises an electrostatic chuck and an edge ring assembly, wherein the edge ring assembly comprises a first edge ring and a second edge ring, the first edge ring is arranged on the periphe...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides an electrostatic chuck device and a dry etching machine. The electrostatic chuck device comprises an electrostatic chuck and an edge ring assembly, wherein the edge ring assembly comprises a first edge ring and a second edge ring, the first edge ring is arranged on the periphery of the electrostatic chuck around the axis of the electrostatic chuck device, the first edge ringis provided with a first slope circumferentially distributed around the axis of the first edge ring, the second edge ring is used for being detachably connected with the first edge ring in the axialdirection, the second edge ring is provided with a second slope circumferentially distributed around the axis of the second edge ring, the first slope and the second slope are used for abutting against each other so as to limit the radial position of the second edge ring relative to the first edge ring. By arranging the first slope and the second slope to abut against each other to assemble the first edge ring and the seco |
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