Substrate-treating apparatus
The invention relates to a substrate-treating apparatus, and the apparatus comprises a vessel configured to provide a treatment space therein; a substrate-supporting unit provided in the vessel to support a substrate; and a spraying member configured to spray treatment solution on the substrate load...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a substrate-treating apparatus, and the apparatus comprises a vessel configured to provide a treatment space therein; a substrate-supporting unit provided in the vessel to support a substrate; and a spraying member configured to spray treatment solution on the substrate loaded on the substrate-supporting unit, wherein the vessel has a cylindrical inner side surface, on which at least one linear texture pattern is formed, the vessel comprises a plurality of collection bottles having entrances positioned at different levels in a vertical direction, each of the pluralityof collection bottles including a bottom portion, the at least one texture pattern is provided on an inner side surface of each of the collection bottles, and at least one linear texture pattern comprises a plurality of linear texture patterns, some of which are provided spaced apart from each other in the cylindrical portion of the vessel by at least two different closest distances.
本申请涉及用于处理基板的装置。该装置包括:器皿,提供处理空间;基板支撑单元, |
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