Indirect heating evaporation source

The invention provides an indirect heating evaporation source capable of increasing the capacity of a container. An indirect heating deposition source (1) is provided with: a container (liner (2)) formed in a bottomed cylindrical shape and filled with a deposition material (4); a container holding section (holder (3)) that holds the container; an electron source (8) that emits hot electrons (electron beams (25)) for electron impact heating of the container; a scanning coil (21) that enlarges the irradiation range of the hot electrons emitted from the electron source. 本发明提供一种能够谋求容器的大容量化的间接加热蒸镀源。间接加热蒸镀源(1)具备：容器(内衬(2))，其形成为有底的筒状，且供蒸镀材料(4)填充；容器保持部(保持件(3))，其保持容器；电子源(8)，其放出用于对容器进行电子冲击加热的热电子(电子束(25))；以及扫描线圈(21)，其使自电子源放出的热电子的照射范围扩大。