Vacuum processing device

The present invention provides a pass-through vacuum processing device in which adequate space savings can be achieved. This vacuum processing device 1 has: a vacuum chamber 2 in which a single vacuumatmosphere is formed; first and second processing regions 4, 5 provided within the vacuum chamber 2, the first and second processing regions 4, 5 having processing sources for performing processes onaflat processing surface of a substrate 10; and a conveyance drive member 33 constituting part of a conveying path for conveying the substrate 10 so as to pass through the first and second processingregions 4, 5. The conveying path is formed so as to comprise a series of annular shapes when projected on a plane (a vertical plane) that includes a normal at an arbitrary point on the processing surface of the substrate 10 being conveyed and a trajectory line segment described by the arbitrary point on the processing surface of the substrate 10 when the substrate 10 passes rectilinearly throughthe first and second process